(Pb_(0.3)Sr_(0.7))_(1-x)K_xTiO_3薄膜制备与介电调谐性能PREPARATION AND DIELECTRIC TUNABILITY OF K-DOPED Pb_XSr_(1-X)TiO_3 FERROELECTRIC THIN FILM
张园,吴敏
摘要(Abstract):
采用溶胶-凝胶法在Pt/TiO2/SiO2/Si衬底上制备了多种不同组分的(Pb0.3Sr0.7)1-xKxTiO3(PST)(x=0,1 mol%,2.5 mol%,5 mol%)多层均匀薄膜,并研究了它们的介电调谐性能。发现掺杂后薄膜的相结构没有发生变化,晶粒尺寸明显减小,介电常数降低及介电损耗减小。1MHz时,随K含量从0增加至5mol%,薄膜的介电常数从841降低至539,而介电损耗由0.134减小到0.0576,其微波介电综合性能改善。
关键词(KeyWords): 钛酸锶铅;K+掺杂;薄膜;Sol-Gel;介电调谐
基金项目(Foundation):
作者(Author): 张园,吴敏
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